Low temperature chemical vapor deposition of TixCyNz coatings
Nowadays, wear resistant coatings based on titanium are frequently deposited at high temperatures, i.e. above 800 ºC, by standard chemical vapor deposition (CVD) methods using corrosive TiCl4 as precursor. The high temperature limits the spectrum of substrates and therefore the coatings applications. In this work, we explore the possibility of depositing TixCyNz coatings using standard CVD techniques at substrate temperatures below 400 ºC. The key factor of this novel CVD process is the modification of the chemistry precursor, which is based on homoleptic titanium complexes featuring diazadiene DAD ligands of the form Ti(DAD)x (x = 2 or 3), and which are suitable for vapor transport with high reactivity for nucleation, facile incorporation of heteroatoms in the film, high tunability of the decomposition temperature and low corrosive by-products of decomposition. Our results highlight the possibility to produce wear resistant TixCyNz coatings on polymeric substrates, which widens the possibilities of their applications.