Analytical prediction model for Direct Laser Interference Patterning
Direct laser interference patterning (DLIP) has proven to be fast and, at the same time, a high-resolution method for the fabrication of large-area surface structures. However, in order to provide structures with adequate quality and defined morphology at the highest possible throughput, the processing parameters have to be carefully selected. Within this parameters, the most relevant are the laser pulse energy, beam diameter, frequency, scan/translation speed, the distance between pulses (overlap), and the hatch-distance. Therefore, the development of a protocol powered by the theoretical model is highly required.
This presentation introduces an analytical model to optimize the DLIP process parameters for achieving the maximal possible fabrication speed for a target structure depth and an average laser power. The developed model considers structures formed by a single scan of the beam in one. To validate it, microstructures with a 5.5 µm spatial period were fabricated on stainless steel employing picosecond DLIP system (10 ps), using a laser source operating at a 1064 nm wavelength. The fabricated line-like periodic structures were characterized by scanning electron and confocal microscopy. The prediction of the analytical model showed a difference of only 10% compared to the experimental results.